Collection: Cerium Oxide Polishing Pad

The Polyurethane Polishing Pads are engineered from natural hydrophobic polyurethane, offering unparalleled efficiency in precision polishing workflows. Unlike synthetic alternatives, these pads uniquely combine rapid material removal with minimal heat generation, making them ideal for demanding applications like optical lens finishing, gemstone polishing, and ceramic surface refinement.

Key Advantages:

1. Hydrophobic Performance:
   • Retains cerium slurry effectively during wet polishing, extending slurry utilization.
   • Reduces water dependency, ideal for dry or low-moisture environments.
2. Enhanced Durability:
   • Longer Lifespan: Outlasts synthetic felt pads due to resilient polyurethane structure.
   • Rounded Edges: Prevents edge chipping or groove formation on delicate surfaces.
3. Thermal Efficiency:
   • Generates less friction and heat vs. synthetic pads, minimizing thermal damage to substrates like glass or soft gemstones.
4. Optimized for Cerium Slurries:
   • Extended slurry charging intervals reduce downtime, boosting productivity in high-volume labs.

Applications:

• Optics & Lenses: Achieve scratch-free finishes on glass lenses or ceramic components.
• Lapidary Work: Polish gemstones or marble surfaces with minimal subsurface damage.
• Industrial Finishing: Ideal for automotive coatings or aerospace composites.

Why Choose Polyurethane Over Synthetic Felt?

Upgrade Your Polishing Process

For industries prioritizing precision, efficiency, and tool longevity, Hans Polyurethane Pads deliver unmatched performance. Pair with cerium oxide slurries for optimal results.