The LP-66 polyurethane cerium oxide polishing Pads are engineered for professionals in lapidary optics, semiconductor, and glass manufacturing who demand uncompromising performance and sub-micron precision. Constructed from hydrophobic polyurethane and infused with cerium oxide, the LP-66 Pad delivers rapid material removal while maintaining ultra-low friction and heat—ideal for polishing heat-sensitive materials like optical lenses, LCD substrates, silicon wafers, and ophthalmic components.
This cutting-edge cerium oxide polishing Pad sets the industry standard for sub-micron polishing, delivering a consistent mirror finish with minimal surface distortion. The hydrophobic design ensures zero water absorption, making the LP-66 Pad suitable for wet or dry workflows across a wide range of materials and geometries.
✅ Key Features:
-
Material: High-density polyurethane foam
-
Designed for use with cerium oxide polishing compound
Excellent surface contact and compound retention -
Ideal for glass , stone, optical materials, and lapidary work
-
Compatible with rotary tools, flat laps, and master laps (Velcro or adhesive-backed versions available)
These polyurethane cerium oxide polishing Pads are particularly effective in removing fine scratches, haze, and micro-pits foam glass surfaces during final-stage polishing. Whether you're a lapidary artist, glass restorer, or optics technician, this Pad ensures high precision and a flawless polish.