Collection: Cerium Oxide Polishing Pad

The LP-66 polyurethane  cerium oxide polishing pads  are engineered for professionals in lapidary optics, semiconductor, and glass manufacturing who demand uncompromising performance and sub-micron precision. Constructed from hydrophobic polyurethane and infused with cerium oxide, the LP-66 Pad delivers rapid material removal while maintaining ultra-low friction and heat—ideal for polishing heat-sensitive materials like optical lenses, LCD substrates, silicon wafers, and ophthalmic components.

This cutting-edge cerium oxide polishing Pad sets the industry standard for sub-micron polishing, delivering a consistent mirror finish with minimal surface distortion. The hydrophobic design ensures zero water absorption, making the LP-66 Pad suitable for wet or dry  workflows across a wide range of materials and geometries.

✅ Features:

• Material: High-density polyurethane foam

• Designed for use with cerium oxide polishing compound

  Excellent surface contact and compound retention

• Ideal for glass , stone, optical materials, and lapidary work

• Compatible with rotary tools, flat laps, and master laps (Velcro or adhesive-backed versions available)

These polyurethane cerium oxide polishing pads are particularly effective in removing fine scratches, haze, and micro-pits foam glass surfaces during final-stage polishing . Whether you're a lapidary artist, glass restorer, or optics technician, this pad ensures high precision and a flawless polish.